Application

Copper Foil Production Polishing of high purity CuSO4 solution prior electrolysis to produce copper foil for PCBs.

Graphite Oxide (GO) Filtration of oxidation agents and GO after reaction with graphite.

High Purity Alumina (HPA) Filtration of Al(OH)3 after the purification stage to produce alumina for sapphire production.

LCD Production Removal of sludge from a mixture of very strong acids such as HF and HCl H2SO4 during the etching of LCD glass.

Lithium Battery Production Filtration of nano particles in the production of electrodes.

Lighting Filtration of halo phosphates.

Silane Filtration of DPR slurries in silane production.

Photoresist Filtration of caustics (NaOH).

Silicon Ingot and Wafer Slicing Separation of very fine particulate from cooling water.

Silicon Wafer Shaping Filtration of cooling water in backside grinding and sawing processes.